Focused Ion Beam Microscope

OptiFIB Taipan Focused Ion Beam for Semiconductors

Circuit Edit System for 10nm and Beyond

Circuit edit technology provides rapid prototyping of small design corrections at various points in the IC manufacturing process: after first silicon debug; for performance enhancements during yield ramp; to create a small number of functioning chips for beta developers; and to resolve reliability issues. Circuit edit engineers mill the chip to the site of the suspected defect, and then remove or deposit conductors or insulators in precise geometries-allowing IC manufacturers to validate design changes without re-spinning masks and processing additional wafers.

To meet the stringent circuit edit requirements of the 10nm node , the FEI OptiFIB Taipan focused ion beam system was engineered to meet the challenges of advanced designs and processes. A new coaxial ion-photon column, electronics, chamber and stage enable a highly controlled beam profile and current, accurate navigation and ion beam placement, and reliable end-pointing. An updated chemical delivery system provides industry-leading etch and deposition chemistries.

Capabilities

  • Imaging and milling resolution to meet 10nm node specifications
  • Excellent navigation and ion beam placement accuracy to ensure high edit success rate at the 10nm node
  • Superb etch selectivity and deposition control for conductors and insulators




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The OptiFIB Taipan focused ion beam delivers FIB image resolution of better than 3nm, demonstrated by imaging tin spheres-critical for navigation to the correct site of the edit and for monitoring and end-pointing the circuit edit work.
Before performing an edit connecting Metal 2 and exposing Metal 3 on a finFET device, the flip chip was trenched over a 200um by 200um area down to the n-wells.
This through-silicon image was obtained on a highly doped power device using the OptiFIB's patented coaxial technology, a technology that allows the user to acquire  simultaneous optical and FIB images.
By overlaying the CAD image with the OptiFIB Taipan focused ion beam's image, GDSDirect enables faster navigation and higher beam placement accuracy.