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Electron Microscopy Solutions
Electrical Failure Analysis

Hyperion System for Semiconductors

Scanning Probe Microscope (SPM) - Based Nanoprobing System with PicoCurrent Fault Visualization


The FEI Hyperion system offers fast, accurate transistor probing for electrical characterization and fault localization in support of semiconductor technology development, yield engineering and device reliability improvement. The unparalleled stability of the Hyperion system enables nanoprobing down to the 10nm technology node and beyond.

Hyperion system's SPM technology enables PicoCurrent imaging-a technique to rapidly identify shorts, opens, leakage paths and resistive contacts with more than 1000 times the sensitivity of passive voltage contrast. The Scanning Capacitance Microscopy (SCM) module provides image-based fault localization for SOI wafers, as well as high resolution dopant profiling.


  • Proven nanoprobing solution for 10nm technology
  • Configurable with four, six or eight probes for added flexibility and capability
  • Auto tip exchange and auto tip approach for increased productivity and ease of use

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The Hyperion system’s advanced measurement modes include: (1) low-noise, high resolution Capacitance-Voltage (C-V) to study oxide layers and interface traps; (2) Pulsed IV to identify open and resistive gate defects; and (3) elevated temperature probing to study device reliability.
PicoCurrent image (left ) indicates suspected transistor, while I-V curves (right) verify anomalous electrical behavior

Current Voltage (I-V) Measurements

Probing multiple transistors within the target area to localize a fault can be time consuming. The Hyperion system combines PicoCurrent imaging with I-V probing to quickly find potential defects and measure current-voltage curves, without introducing measurement-related shifts.

Capacitance Voltage (C-V) Measurements

C-V is used to study oxide layers, interface traps and charge carrier densities. The Hyperion system offers high resolution C-V with excellent impedance control, low leakage and very low noise.

C-V measurements of multi-gate to NMOS drain C-V
PicoCurrent image (left ) indicates suspected transistor, while I-V curves (right) verify anomalous electrical behavior

Pulsed I-V Measurements

Pulsed I-V is used for studying self-heating of SOI and trapped charge in high-k dielectric. The Hyperion system enables high-speed testing of devices with less than one nanosecond rise time.