The FEI Helios NanoLab™ 460HP DualBeam™ accurately locates the defect in repeating structures using automated sample navigation with FEI’s Cell Navigator. This improves the success rate of finding the intended region of interest by greater than 5%. In addition, the patented inverted TEM sample preparation method, enabled by FEI’s EasyLift EX Nanomanipulator, QuickFlip shuttle, and iFast automation software platform, delivers the highest throughput in the industry. Improved materials contrast enabled by new low-loss in-lens detectors, along with extreme high-resolution SEM imaging at low kV, ensures accurate endpointing, which results in increased yield during final thinning of the TEM sample.
The combination of these unique features results in a >30% improvement in TEM lamella throughput over the Helios NanoLab 450 DualBeam.