Nanofabrication and rapid prototyping with DualBeam instruments
Focused ion beam (FIB) milling of patterns in any kind of material and the precise beam induced deposition of various materials in one single instrument are recognized as novel ways of true rapid prototyping. The capabilities to observe the patterning process live and to immediately image the resulting structures with high resolution offer unique control over the patterning process and provide an immediate feedback loop for the operator. Successful nanoprototyping requires dedicated strategies for the execution of pattern designs owing to the characteristics of the FIB-substrate interaction. The impact of different patterning strategies is illustrated in this application note and may serve as guideline for successful nanofabrication.
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