DualBeam Solutions for Electrical Nanoprobing
Testing and failure analysis of integrated circuits has traditionally been done by physical electrical probes guided by optical microscopy. However, today's geometries are too small for conventional electrical probing techniques. DualBeam systems have been adapted to solve nanoprobing challenges. The tools are routinely used to perform failure analysis, fault isolation, device debug, and circuit editing-enabling engineers to quickly diagnose design and production problems and to determine corrective actions. DualBeam probe testing during development and production ramp-up can improve device yield and performance and greatly speed time-to-market.
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