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Electron Microscopy Solutions

Tungsten Deposition

Gas chemistry solution for Ion or Electron beam deposition of Tungsten-containing material.

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Key Benefits:

  • Complete solution
  • Low resistivity pads and lines for device edit (Circuit Edit)
  • In case low electrical resistance of the deposited material is required
  • contacting very small structures
  • Gas flow control based on accurate temperature setting
  • Homogeneous temperature for full gas path
  • Local gas density fluctuations at sample < 6 % over a width of 100 um
  • Double container safety control
  • 100 % free of any cross-contamination
  • Instantaneous gas delivery
  • No gaseous precursors


The package includes the gas precursor, deposition enhancement gas, injection needle, gas injector system and controller.

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