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Electron Microscopy Solutions

Enhanced Etch

Gas chemistry solution (Iodine) for enhanced etching of metals and silicon, mounted on any of the available GIS ports.

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Key Benefits:

  • Complete solution
  • Reduction of re-deposition
  • Speed up milling process (faster than ion beam alone)
  • To prevent re-deposition of the milled metal material, ensuring electrical isolation when severing a metal line
  • Gas flow control based on accurate temperature setting
  • Homogeneous temperature for full gas path
  • Local gas density fluctuations at sample < 6 % over a width of 100 um
  • Double container safety control
  • 100 % free of any cross-contamination
  • Instantaneous gas delivery
  • No gaseous precursors

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