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Electron Microscopy Solutions


Nanomaterials offer tremendous opportunity and challenges for researchers.  With unique optical, magnetic, electrical and mechanical properties - all occurring at the nanoscale - these materials have properties that can vary with length scale, changing continuously or instantly.

To correlate device performance to structure or design requires research solutions that offer a complete workflow, from CAD to prototyping to characterization, with the ability to work with length scales that can go as small as tens of nanometers. 

Leading MEMS and NEMS engineers are using FEI solutions to build functional devices and fully characterize their physical and mechanical properties. Using CAD data and the highest accuracy beam chemistries to precisely direct the prototyping process, researchers using FEI solutions are getting their devices to market faster, with greater cost efficiencies. 

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Create functional prototypes using Helios G4 UX DualBeam

Helios G4 UX provides the capability for rapid, precise milling and deposition of the most varied and intricate 3D structures, with critical dimensions of less than 10 nm, including fabrication of multiple prototype structures written over a large area. FEI's NanoBuilder™ 2.0 lets you plan construction of multi-layer nanostructures and guides the patterning processes: focused ion beam (FIB) milling, gas-assisted FIB milling, FIB induced deposition and electron-induced deposition.

In addition to its prototyping capabilities, the Helios G4 UX will deliver the best nanoscale details over the widest range of working conditions. Whether operating at 30 kV in STEM mode to access structural information, or at 500 V to obtain charge-free, detailed information from the surface, it delivers well below 1 nm resolution. And with unsurpassed fast, precise and reliable milling and exceptional low voltage FIB performance, Helios G4 UX is proven to produce the best quality thin samples for atomic scale S/TEM or atom probe microscopy.

Learn more about Helios G4 UX or download the NanoBuilder 2.0  datasheet  for more information about our unique nanoprototyping toolset.

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Nanofabrication and rapid prototyping with DualBeam instruments

Focused ion beam (FIB) milling of patterns in any kind of material and the precise beam induced deposition of various materials in one single instrument are recognized as novel ways of true rapid prototyping. The capabilities to observe the patterning process live and to immediately image the resulting structures with high resolution offer unique control over the patterning process and provide an immediate feedback loop for the operator. Successful nanoprototyping requires dedicated strategies for the execution of pattern designs owing to the characteristics of the FIB-substrate interaction. The impact of different patterning strategies is illustrated in this application note and may serve as guideline for successful nanofabrication.

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Products for Nanodevices

Helios G4 FX DualBeam for Materials Science
The Helios G4 FX DualBeam™ microscope is the world's first DualBeam™ to incorporate a TEM-like CompuStage for TEM lamella sample preparation and combine it with an all-new in-lens STEM 4 detector to drastically reduce the time to high-quality, useable data.
Helios G4 UX DualBeam for Materials Science
The latest technological innovations of the FEI Helios G4 DualBeam™ microscope, in combination with the easiest to use, most comprehensive software and FEI's application expertise, allow for the fastest and easiest preparation of site-specific, ultra-thin HR-S/TEM samples for a wide range of materials.

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Electron Microscopy Solutions

We have updated the appearance of FEI.com with the Thermo Fisher Scientific brand. This transition is an exciting moment as we continue to advance our world-leading electron microscopy solutions.