Create functional prototypes using Helios G4 UX DualBeam
Helios G4 UX provides the capability for rapid, precise milling and deposition of the most varied and intricate 3D structures, with critical dimensions of less than 10 nm, including fabrication of multiple prototype structures written over a large area. FEI's NanoBuilder™ 2.0 lets you plan construction of multi-layer nanostructures and guides the patterning processes: focused ion beam (FIB) milling, gas-assisted FIB milling, FIB induced deposition and electron-induced deposition.
In addition to its prototyping capabilities, the Helios G4 UX will deliver the best nanoscale details over the widest range of working conditions. Whether operating at 30 kV in STEM mode to access structural information, or at 500 V to obtain charge-free, detailed information from the surface, it delivers well below 1 nm resolution. And with unsurpassed fast, precise and reliable milling and exceptional low voltage FIB performance, Helios G4 UX is proven to produce the best quality thin samples for atomic scale S/TEM or atom probe microscopy.
about Helios G4 UX or download the NanoBuilder 2.0
for more information about our unique nanoprototyping toolset.