Verios XHR SEM

Discover the world of Extreme High Resolution SEM

The Verios is the second generation of FEI's leading XHR SEM family, offering accurate imaging with sub-nanometer resolution over the full 500 eV to 30 keV energy range and excellent contrast needed for precise measurements on materials in advanced Semiconductor manufacturing, Life Science and Materials Science applications. As easy to use as a normal SEM and extremely flexible when it comes to choosing parameters, working on large samples or supporting additional applications like analysis or lithography, the Verios XHR SEM allows both occasional users and specialists to access accurate and complete nanoscale data in the shortest time, and discover information that has been unavailable previously from other techniques.

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Verios XHR SEM for Electronics

Extends SEM Capability

In the Semiconductor and Data Storage markets, the Verios's unprecedented performance significantly extends SEM capability to the 22 nm node and below, offering a complete solution for basic research, process and material development, process control and failure analysis. It delivers accurate, repeatable measurement results, even on extremely sensitive materials. Combined with FEI's IC3DTM metrology software, Verios provides precise measurements needed to control technology development process. The Verios features industry leading performance without compromising the high throughput, sample flexibility and ease of traditional SEM.

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Verios XHR SEM for Life Sciences

Stunning resolution and refined contrast on biological samples

Verios extends today's SEM capability. It delivers eXtreme High Resolution (XHR) and spectacular contrast, thanks to multiple in-column detectors and advanced optics. The Elstar™ FESEM column, with its integrated monochromator and beam deceleration, which enables Verios's unique low kV performance, also features other unique technologies such as constant power lenses for higher thermal stability and electrostatic scanning for higher deflection linearity. It provides nanometer scale, low-kV characterization of beam sensitive, biological samples while offering ease of use and versatility by simultaneous imaging of secondary electrons and backscattered electrons. Complemented by two new in-column detectors and signal filtering capabilities it stands for stunning resolution and refined contrast. Furthermore, an optional scanning transmission electron mode (STEM) detector provides superior performance on thin biological S/TEM samples.

Mouse Brain Tissue, heavy metal stained and resin embedded. Thin sections (40nm) cut on ATUM microtome, collected on tape and mounted on silicon wafers. Backscatter electrons were imaged by the Verios' XHR ICD detector. Sample courtesy of Prof. J. Lichtman, Harvard University, US. Imaged by Ingo Gestmann, FEI

Image organelles at high resolution whilst preserving sample integrity

With sensitive biological samples, beam damage from high imaging voltages prevents seeing the critical details in cellular research. The Verios XHR scanning electron microscope (SEM) can be operated at a beam voltage as low as 1kV to minimize sample interference without sacrificing resolution and contrast. Biological researchers can now handle a wider range of sensitive biological samples and quickly achieve the high resolution images necessary to understand the key functions and processes of organelles.


STEM image of cortex tissue (53kx31k pixels), 0.5 nm/pixel Sample courtesy: Dr G Knott, EPFL, Switzerland 


Verios XHR SEM

Verios™ XHR Scanning Electron Microscope The Verios is the second generation of FEI’s leading XHR (extreme high resolution) SEM family. It provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials

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Verios XHR SEM for Materials Science

In modern materials research, Verios enables important new insights by extending its sub-nanometer characterization capabilities to materials being developed today, such as catalyst particles, nanotubes, porosities, interfaces, biological objects and other nanoscale structures, offering full flexibility to also accommodate large and beam sensitive specimens without causing sample damage.

Experience the advantages offered by the Verios XHR SEM:

  • Access accurate, true nanometer scale information with operating conditions that best matches your sample requirements: 500 eV and below for non-conductive specimens, very low dose operation for beam sensitive samples, using the ElstarTM monochromator and optimized optics and detection;
  •  Gather complete nanoscale information, fast: topographic and materials contrast, thanks to Elstar's unique quadruple SE/BSE detection and filtering; structural contrast, thanks to FEI's unique multi-segmented STEM technology;
  • Rely on accurate metrology far beyond a normal SEM, using Elstar's precise electrostatic beam deflection and advanced calibration methods;
  • Experience fast and precise sample management: accommodating large specimens, controllably cleaning sample surfaces, rapidly inspecting at very low magnification and navigating to the region of interest;
  • Perform innovative and precise nanofabrication using electron beam lithography, electron beam induced direct deposition of materials, and inspect the created 3D structures in top-down or tilted positions;
  • Discover a platform optimized both for the occasional user with a simple and robust interface, and the SEM expert who can rely on the instrument's flexibility and extended controls to exactly tune the instrument for a specific experiment. 


Verios XHR SEM Datasheet

Download the datasheet and learn more about the performance and technical specifications of the Verios XHR SEM.

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