Helios NanoLab 650 DualBeam

The Helios NanoLab™ 650 features FEI’s most recent advances in field emission SEM (FESEM) and focused ion beam (FIB) technologies and their combined use. As FEI’s 11th DualBeam™ platform, it is designed to access a new world of extreme high resolution (XHR) 2D and 3D characterization, 3D NanoPrototyping, and higher quality sample preparation.

The outstanding imaging capabilities of the Helios NanoLab begin with its Elstar™ FESEM. Thanks to its integrated monochromator (UC) and beam deceleration, it delivers sub-nanometer resolution across the whole 1-30 kV range. The Elstar features other unique technologies such as constant power lenses for higher thermal stability and electrostatic scanning for higher deflection linearity and speed. Its through-the-lens detector, set for highest collection efficiency of SE (secondary electrons) and on-axis BSE (backscattered electrons), is complemented by FEI’s latest advanced detection suite including three novel detectors: two multi-segment solid state detectors for stunning low kV SE/BSE and S/TEM (scanning transmission electron mode) performance, and a third dedicated to optimized FIB-SE and -SI (secondary ion) imaging.

Key Features

• Best-in-class Elstar™ monochromated Schottky FESEM technology and performance, with subnanometer resolution from 1 to 30 kV
• FEI’s own versatile Tomahawk FIB, featuring excellent FIB imaging, outstanding low kV operation down to 500 V and up to 65 nA beam current
• 150 x 150 mm high precision, high stability piezo stage
• Unique imaging technologies and solutions, including Helios generation II detection and scanning strategies, process monitoring and endpointing
• Most complete and integrated suite of prototyping capabilities, with the integrated 16-bit pattern generator, advanced patterning features library and largest GIS offering and expertise
• Best-in-class thin sample preparation and 3D characterization and analysis

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Application Images

For unsurpassed fast, precise and reliable milling, patterning and ion imaging, the Helios NanoLab 650 relies on FEI’s latest ion column, the Tomahawk FIB. The Tomahawk’s exceptional low-voltage performance is proven to produce the world’s best quality thin samples for high resolution STEM or atom probe microscopy. Not only does it boast excellence in ion image resolution, with its integrated differential pumping and time-of-flight correction, it also delivers a tighter beam and a more accurate scan profile for extremely precise ion milling. Creating the most complex structures at the nanoscale is equally possible, thanks to FEI’s own extensive range of beam chemistries (gas injection), 16-bit pattern generator and integrated CAD, script or library-based patterning. Robust, precise FIB slicing, combined with a high precision piezo stage and superb SEM performance, open the door to a new generation of automated software for unattended sample preparation or 3D characterization and analysis.

Empowered by its evolutionary xT software platform, the Helios NanoLab 650 addresses both the occasional user with its easy-to-use yet robust and comprehensive interface, and the FIB expert who can rely on the instrument’s flexibility and extended controls for advanced SEM and FIB work. Join the Helios NanoLab and FEI FIB communities of scientists and technologists and be the next one to contribute to expanding the boundaries at the nanoscale with DualBeams.