The FEI UHV Magnum-based focused ion beam (FIB) subsystem provides a multi-purpose, nanometer scale patterning, milling and imaging solution. This subsystem is ideal for UHV applications, providing a bolt-on FIB capability to a custom or existing system.
UHV Magnum Column Applications
- Micro cross-sectioning
- In-situ imaging of samples
- UHV scanning ion microscopy
- High resolution SIMS imaging
- Nanometer-scale micromachining
- Selective area Auger depth profiling
- Add-on FIB capability
Nanometer-Scale Imaging, Micromachining and Mapping
FEI's Two-Lens UHV Magnum Ion column provides 5 to 7 nm resolution with FEI's gallium Liquid Metal Ion Source (LMIS) and FEI's Beam Deflection System (BDS). FEI's precision optics ensures controlled, high current density beam profiles for precise ion milling while maintaining high-resolution imaging capabilities.
The UHV Magnum is tested UHV compatible and mounts with a 4.5" Conflat flange or a 6" Conflat flange. The UHV Magnum’s narrow 8.75" vacuum extension provides easy integration into systems with detectors and other components near the sample area. A differential pumping aperture separates the source region’s vacuum from the sample region's vacuum. A separate ion pump is needed to maintain source area vacuum.
A focused ion beam creates unique imaging mechanisms unavailable with electron beams. Some of these mechanisms include: secondary ion microscopy, near surface secondary electron microscopy, ion channeling contrast, depth profiling and secondary ion mass spectrometry.
Configured for Your Needs
The UHV Magnum is equipped with a mechanically variable aperture for ease of use and ability to operate with a wide range of beam currents, allowing the UHV Magnum to complete high-speed milling and very precise imaging in a 5 nm range. The probe currents available range from 1 pA to 20nA.
Easy to Use
The column's LMIS emitter is simple to install and provides a trouble-free operation over a long lifetime. The BDS 200 electronics provide for beam current stabilization through integrated feedback loops. The column isolation valve separates the source region from the sample chamber, allowing the LMIS to be changed without disturbing the system vacuum. Conversely, the system vacuum can be vented without disturbing the source area vacuum.