FEI's DualBeam™ focused ion beam and scanning electron microscope (FIB SEM) instruments offer beam/gas chemistries, software automation, digital pattern generation and simultaneous patterning and imaging that allow rapid creation or modification of 3D structures and prototyping of devices at the nanoscale.
FIB milling and electron and ion beam-induced deposition can be used separately or in combination to fabricate complex structures such as quantum dot and photonic arrays, nanofluidic devices, chemical cells and nanopiezo sensors, as well as for performing photolithographic mask writing and repair, made possible with FEI's robust suite of tools for direct electron and ion beam lithography. Software provides accurate control over patterning, milling and deposition parameters. In situ deposition of electrical nanocontacts can be combined with electrical probing for direct measurement of functional properties. Surfaces can be nano-textured over large areas and detailed 3D topography can be produced.
DualBeam™ systems for 3D NanoPrototyping:
More Applications for Research: