Metrology of complex structures is a highly demanding application that requires precision that is repeatable and referenced to relevant, attributable standards. Sometimes a single measurement will suffice. However, often the same parameter needs to be captured from every single manufactured component at every step of a process, and then calibrated with every other metrology tool in the manufacturing process.
SEM and DualBeam™ microscopy measurements can be applied in two basic ways:
- Rapid, top-down parameter checks run in an automated way with referenced standards
- Detailed 3D measurements taken on a subset of features to check a large batch of products for conformity.
The method of measurement capture will always define how that measurement must be taken, and the measurement method defines the standards that can be applied. FEI produces a comprehensive suite of charged particle microscopy tools to examine everything from a dirty engine part to a 40 atomic monolayer oxide coating referenced to the atomic spacing of gold.
Learn more about the Quanta 200 3D, the Nova NanoSEM, and the Nova NanoLab which are used for macro sample to nanometer metrology: