The application of nanotechnology to existing manufacturing processes is now being realized for consumer products. Cost savings and performance improvements for products based on nanotech-assisted steps or processes are helping companies gain a unique competitive edge, especially for the early adopters of these novel techniques. For example, blue/green GaN LED lasers are now everyday products, and only three years ago they existed in only a few labs as prototypes.
The ability to rapidly prototype and produce small production volumes of new processes that require custom nano-writing and machining steps can be achieved with FEI's direct-write Electron and Ion Beam lithography capabilities. 2D surfaces can be nano-textured over large areas, or detailed 3D topography can be produced for nano-replication or direct prototyping.
Samples as diverse as quantum dot arrays, individual SQUID junctions, large area magnetic domain devices, automated AFM tips customization, large photonic arrays, wafer patterning, photolithographic mask writing and repair, or electron and ion beam lithography are all possible with FEI's robust suite of tools for direct beam-writing fabrication.
Learn more about FEI SEM and DualBeam™ tools for direct beam-writing fabrication: